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■Type
Classification by
production process |
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MARUWA QUARTZ
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| Equivalents at other material makers |
| Momentive Performance Materials Inc. |
Sumitomo Metal Industries, Ltd. |
TOSO Quartz Corp. |
SAINT-GOBAIN |
| Electrically fused product |
KE |
FN-101 |
124, 214 |
SK-3030 |
HR |
ST-10 |
| Oxyhydrogen fused product |
KF |
FN-102 |
- |
SK-4304 |
N |
VITREOSIL, TSC-2 |
| High-purity electrically fused product |
KE-FS |
FH-301 |
144, 224 |
SK-3036 |
HRP |
- |
| High-purity oxyhydrogen fused product |
KF-F1 |
FH-302 |
- |
SK-4306 |
NP |
TSC-4, -5 |
| Electrically fused synthetic silica |
- |
FS-401 |
0.12 |
- |
- |
- |
| Flame fused synthetic silica |
SY |
FS-402 |
- |
SK-1300 |
ES |
SPECTROSIL |
MARUWA is an authorized fabricator and distributor of Momentive Performance Materials Inc.
Momentive Performance Materials Inc. also serves customers as the source of stable supply of materials, as well as researcher/developer of material quality and technology. |
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■Example of analysis of impurities
Unit : ppm
| MARUWA QUARTZ Part No. |
Al |
Fe |
Cu |
Na |
K |
Li |
OH |
| KE |
FN-101 |
14.0 |
0.2 |
<0.05 |
0.8 |
0.6 |
0.6 |
<5 |
| KF |
FN-102 |
15.0 |
0.3 |
<0.03 |
0.8 |
0.7 |
0.4 |
about150 |
| KE-FS |
FH-301 |
8.0 |
0.2 |
<0.05 |
<0.2 |
0.4 |
0.2 |
10 |
| KF-F1 |
FH-302 |
9.0 |
0.2 |
<0.03 |
0.1 |
0.1 |
<0.1 |
150 |
| - |
FS-401 |
<0.2 |
<0.08 |
<0.03 |
<0.05 |
<0.05 |
<0.05 |
≤5 |
| SY |
FS-402 |
<0.04 |
<0.05 |
<0.03 |
<0.02 |
<0.02 |
<0.02 |
≤200 |
*Typical analytical values by product |
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■Mechanical properties
| Characteristic |
Transparent quartz glass |
Unit |
| Density |
2.203 |
g/cm3 |
Compressive
strength |
1.1x109 |
Pa |
Tensile
strength |
4.8x107 |
Pa |
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The various data show the measured values of quartz glass, not the specification values. The strength differs according to the welding method and shape. Contact us for details when placing an order. |
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■Processed products of quartz glass
Processed products of quartz glass are made by selecting the best material from among many types of materials so as to meet the users' specifications shown in drawings and documents. Contact the nearest sales office for the details in time of delivery and specifications. |
• Jig for diffusion/CVD process
Most furnaces are vertical these days. Large quartz are also offered to make wafers of 300 mm in diameter.
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• Jig of etching/ashing process
Many wafer processing type machines are used for the etching and ashing processes. Quartz tools used in these processes are machined into various shapes.
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• Washing process tool
Quartz tanks used in the washing process are indispensable for wafer processing. Large tanks are also available for processing wafers of 300 mm in diameter.
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• Other processed products
Use of quartz glass processed products is not limited to the semiconductor process. They are also used for preform fabrication of optical fibers.
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